Strong Acid Resistant Fast Drying UV Resin

 

T-7111N resin is recommended for use in photosensitive development resist processes, and the development will be clear and without residue. It can resist all kinds of strong acid etching liquids and weak alkaline erosion. 100% solvent-free, suitable for printing and spraying processes. It dries quickly, surfaces quickly, and dries smoothly without sticking. It has excellent adhesion to all types of metals, glass, ceramics, and copper-clad laminates. After UV curing, the hardness, insulation, and etching resistance reach the optimal state before the etching process can be carried out. It is used for protective functions during metal marking, glass acid engraving, anodizing, circuit board etching, electroplating and other processing.

In UV ink applications, T-7111N resin is used for full-page printing by screen printing. It dries quickly and does not stick to film. High resolution, clear development with sodium carbonate (20s development), 5% sodium hydroxide hot alkali to remove the film in 1-3 minutes. In the field of UV coatings, spray coating can be used when processing 3D curved glass, special-shaped metal sheets, and nameplates. The pigment has excellent wettability and can be added with color. Has excellent adhesion to a variety of materials.

 

 

 

 

 

T-7111N is used in exposure and development technology

 

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